Huawei Patents Method to Create 2nm Chips Without EUV
Huawei has secured a patent for a new method that could allow the company to manufacture chips at the 2nm level using deep ultraviolet (DUV) lithography, bypassing the need for extreme ultraviolet (EUV) technology. This development could be significant as EUV equipment remains expensive and restricted.
📌 Key Takeaways
✓Huawei patents new chip manufacturing technique
✓Method uses DUV instead of expensive EUV equipment
✓Aims to replicate high-resolution patterns for advanced semiconductors
Patent DetailsThe patent details a novel approach to chip fabrication that relies on DUV techniques, which are more widely available than EUV systems. According to the document, this method aims to replicate the high-resolution patterns needed for advanced semiconductor production without depending ...
