DUV Archives - Huawei NewOS

Huawei has secured a patent for a new method that could allow the company to manufacture chips at the 2nm level using deep ultraviolet (DUV) lithography, bypassing the need for extreme ultraviolet (EUV) technology. This development could be significant as EUV equipment remains expensive and restricted. 📌 Key Takeaways ✓Huawei patents new chip manufacturing technique ✓Method uses DUV instead of expensive EUV equipment ✓Aims to replicate high-resolution patterns for advanced semiconductors Patent DetailsThe patent details a novel approach to chip fabrication that relies on DUV techniques, which are more widely available than EUV systems. According to the document, this method aims to replicate the high-resolution patterns needed for advanced semiconductor production without depending ...

Huawei has revealed that an older patent they filed might enable the production of advanced 2nm chips using less cutting-edge Deep Ultraviolet (DUV) lithography, according to recent reports. This could significantly impact their manufacturing capabilities and potentially offer a workaround for current limitations in semiconductor fabrication. 📌 Key Takeaways ✓Huawei's three-year-old patent could revolutionize chip production for the company ✓The patent allows use of less advanced DUV lithography for 2nm chips ✓This advancement may reduce dependence on EUV technology and high costs Patent DetailsThe patent in question was filed by Huawei three years ago but has recently gained attention due to its potential implications on the company's chip production processes. The technology descr...

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Huawei Patents Method to Create 2nm Chips Without EUV

Huawei Patent May Enable 2nm Chip Production with Older DUV Technology