Huawei Patent May Enable 2nm Chip Production with Older DUV Technology
Huawei has revealed that an older patent they filed might enable the production of advanced 2nm chips using less cutting-edge Deep Ultraviolet (DUV) lithography, according to recent reports. This could significantly impact their manufacturing capabilities and potentially offer a workaround for current limitations in semiconductor fabrication.
📌 Key Takeaways
✓Huawei's three-year-old patent could revolutionize chip production for the company
✓The patent allows use of less advanced DUV lithography for 2nm chips
✓This advancement may reduce dependence on EUV technology and high costs
Patent DetailsThe patent in question was filed by Huawei three years ago but has recently gained attention due to its potential implications on the company's chip production processes. The technology descr...








